Name: | |
Equipment: | Ophir SP620U |
Applications: | Laser beam characterization Alignment |
Properties: | CCD Beam Profiler 1/1.8” format, high resolution, wide dinamic range 190-1100nm pulsed and CW lasers |
Tested materials: | |
Category: | ANALYSIS AND CHARACTERIZATION |
Laboratory: | Spain - UPM |
Specifications
Method | Min feature size | Working area | Process speed |
Optical | Active area: 7.1×5.4mm (1600×1200 pixels) |