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Name:
Equipment: Ophir SP620U
Applications: Laser beam characterization Alignment
Properties: CCD Beam Profiler 1/1.8” format, high resolution, wide dinamic range 190-1100nm pulsed and CW lasers
Tested materials:
Category: ANALYSIS AND CHARACTERIZATION
Laboratory: Spain - UPM
No image available

Specifications

Method Min feature size Working area Process speed
Optical Active area: 7.1×5.4mm (1600×1200 pixels)