| Name: | |
| Equipment: | Ophir SP620U |
| Applications: | Laser beam characterization Alignment |
| Properties: | CCD Beam Profiler 1/1.8” format, high resolution, wide dinamic range 190-1100nm pulsed and CW lasers |
| Tested materials: | |
| Category: | ANALYSIS AND CHARACTERIZATION |
| Laboratory: | Spain - UPM |
Specifications
| Method | Min feature size | Working area | Process speed |
| Optical | Active area: 7.1×5.4mm (1600×1200 pixels) |