| Name: | |
| Equipment: | Ekspla NL640 |
| Applications: | Polymer patterning by UV, other low power UV applications. Can handle immersed samples. |
| Properties: | 6-14ns, 6W @40 kHz. 1064, 532, 355 nm harmonics available. |
| Tested materials: | TPRI activation for CdSe quantum dots. |
| Category: | |
| Laboratory: | Lithuania - FTMC |
Specifications
| Method | Min feature size | Working area | Process speed |
| ns Ultrashort Pulse Laser Ablation with DUV output | 5 um | 10×10 cm | 100 mm/s |