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Equipment: Ekspla NL640
Applications: Polymer patterning by UV, other low power UV applications. Can handle immersed samples.
Properties: 6-14ns, 6W @40 kHz. 1064, 532, 355 nm harmonics available.
Tested materials: TPRI activation for CdSe quantum dots.
Laboratory: Lithuania - FTMC
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Method Min feature size Working area Process speed
 ns Ultrashort Pulse Laser Ablation with DUV output 5 um 10×10 cm  100 mm/s