Hub partner: FTMC
Additional information:
Multi-beam interference patterning technique uses direct laser ablation, but in this method, ablation is made with intensity profile produced by two or more laser beams. This technique offers patterning versatility: it is applicable to various materials (thin films and bulk materials), size (period) of the pattern and pattern shape can be varied. Smallest period – 400 nm can be achieved using 355 nm irradiation.
Equipement:
• Nanosecond laser
• Picosecond laser
• Femtosecond laser
Contact: Simonas Indrišiūnas
Email: simonas.indrisiunas@ftmc.lt
Competence category: Laser processing trials, Laser process (technology) development, Implementation of laser technologies , Product development