| Expertise: | Laser beam interference ablation |
| Additional information: | Multi-beam interference patterning technique uses direct laser ablation, but in this method, ablation is made with intensity profile produced by two or more laser beams. This technique offers patterning versatility: it is applicable to various materials (thin films and bulk materials), size (period) of the pattern and pattern shape can be varied. Smallest period – 400 nm can be achieved using 355 nm irradiation. |
| Equipement: | • Nanosecond laser • Picosecond laser • Femtosecond laser |
| Contact person: | Simonas Indrišiūnas |
| Email: | simonas.indrisiunas@ftmc.lt |
| Category: | 6. Concept assessment |
| Laboratory: | Lithuania - FTMC |
