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Name:
Equipment: Hitachi 3000N
Applications: Examination of surface morphology, image magnification, measurement with high resolution. Analysis structual and identification of metals and materials. Classification of material. Analysis of thin films.
Properties: Scanning electron microspe (include EDX microanalysis); Magnification x15-300K EDX: working distance 15 mm. X-ray take-off angel (TOA) 35 °
Tested materials:
Category: ANALYSIS AND CHARACTERIZATION
Laboratory: Spain - UPM
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Specifications

Method Min feature size Working area Process speed
Secondary electrons SE 3.5 nm Specimen size 150 mm (dia.) max. X: 0-100 mm,Y: 0-50 mm, Z: 5-40 mm. Tilt -20° to 90° Rotation 360°, continuous. Ultimate vacuum: 1.5E-3. Low vacuum range: 1 to 270 Pa.
Back scattered electron BSE 5 nm