| Name: | |
| Equipment: | Hitachi 3000N |
| Applications: | Examination of surface morphology, image magnification, measurement with high resolution. Analysis structual and identification of metals and materials. Classification of material. Analysis of thin films. |
| Properties: | Scanning electron microspe (include EDX microanalysis); Magnification x15-300K EDX: working distance 15 mm. X-ray take-off angel (TOA) 35 ° |
| Tested materials: | |
| Category: | ANALYSIS AND CHARACTERIZATION |
| Laboratory: | Spain - UPM |
Specifications
| Method | Min feature size | Working area | Process speed |
| Secondary electrons SE | 3.5 nm | Specimen size 150 mm (dia.) max. X: 0-100 mm,Y: 0-50 mm, Z: 5-40 mm. Tilt -20° to 90° Rotation 360°, continuous. | Ultimate vacuum: 1.5E-3. Low vacuum range: 1 to 270 Pa. |
| Back scattered electron BSE | 5 nm |