Name: | |
Equipment: | Spectra Physics Explorer |
Applications: | Thin film ablation, Surface texturing, PV materials processing, LIFT processes, Thin film photovoltaic micromachining, Laser doping, Scribing of thin film solar cells, Laser firing processes, Material doping. |
Properties: | DPSS Nd:YVO4 532 nm, 2 W @ 50 kHz, Pulse duration: 15 ns, Pulse frequency: 20-150 kHz, Energy attenuator, Beam shaper (piShaper) for 532 nm, XYZ stages, Scanner. |
Tested materials: | Laser induced forward transfer (LIFT) of Ag pastes, Local laser doping, Laser fired contacts for PV. |
Category: | LASER SOURCES |
Laboratory: | Spain - UPM |
Specifications
Method | Min feature size | Working area | Process speed |
ps Ultrashort Pulse Laser Ablation | ~20 µm | Scanner: 10×10 cm Stages: 30 x30 cm |
Scanner: 3 mm/s-10 m/s Stages: up to 0.3 m/s at 0.1 µm resolution |